JPH0356623B2 - - Google Patents

Info

Publication number
JPH0356623B2
JPH0356623B2 JP58135960A JP13596083A JPH0356623B2 JP H0356623 B2 JPH0356623 B2 JP H0356623B2 JP 58135960 A JP58135960 A JP 58135960A JP 13596083 A JP13596083 A JP 13596083A JP H0356623 B2 JPH0356623 B2 JP H0356623B2
Authority
JP
Japan
Prior art keywords
image
plate
photosensitive layer
silicone rubber
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58135960A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6028654A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP13596083A priority Critical patent/JPS6028654A/ja
Publication of JPS6028654A publication Critical patent/JPS6028654A/ja
Publication of JPH0356623B2 publication Critical patent/JPH0356623B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP13596083A 1983-07-27 1983-07-27 湿し水不要平版印刷版の製版方法 Granted JPS6028654A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13596083A JPS6028654A (ja) 1983-07-27 1983-07-27 湿し水不要平版印刷版の製版方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13596083A JPS6028654A (ja) 1983-07-27 1983-07-27 湿し水不要平版印刷版の製版方法

Publications (2)

Publication Number Publication Date
JPS6028654A JPS6028654A (ja) 1985-02-13
JPH0356623B2 true JPH0356623B2 (en]) 1991-08-28

Family

ID=15163865

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13596083A Granted JPS6028654A (ja) 1983-07-27 1983-07-27 湿し水不要平版印刷版の製版方法

Country Status (1)

Country Link
JP (1) JPS6028654A (en])

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2814279B2 (ja) * 1990-02-02 1998-10-22 コニカ株式会社 水なし感光性平版印刷版用現像液

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5559466A (en) * 1978-10-26 1980-05-02 Toray Ind Inc Lithographic printing plate without requiring dampening water
JPS57205740A (en) * 1981-06-15 1982-12-16 Toray Ind Inc Method for fixing negative type lithographic plate requiring no dampening water
JPS5835539A (ja) * 1981-08-27 1983-03-02 Toray Ind Inc 湿し水不要ネガ型平版印刷版の製版方法
JPS5917552A (ja) * 1982-07-21 1984-01-28 Toray Ind Inc 画像形成用積層体の処理方法

Also Published As

Publication number Publication date
JPS6028654A (ja) 1985-02-13

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